Publications
, "Measurement of minority carrier diffusion length in p-GaN using electron emission spectroscopy (EES)", Applied Physics Letters, vol. 122, 2023.
, "Materials progress for the development of beta-Ga2O3 for power electronics", Oxide-based Materials and Devices XII: International Society for Optics and Photonics, 2021.
, "Metalorganic chemical vapor deposition-grown tunnel junctions for low forward voltage InGaN light-emitting diodes: epitaxy optimization and light extraction simulation", Semiconductor Science and Technology, vol. 36, pp. 035019, 02/2021.
, "Mg doping and diffusion in (010) β-Ga2O3 films grown by plasma-assisted molecular beam epitaxy", Journal of Applied Physics, vol. 130, 12, 2021.
, "Metal oxide catalyzed epitaxy (MOCATAXY) of β-Ga2O3 films in various orientations grown by plasma-assisted molecular beam epitaxy", APL Materials, vol. 8, pp. 021104, 2020.
, "Metalorganic chemical vapor deposition grown n-InGaN/n-GaN tunnel junctions for micro-light-emitting diodes with very low forward voltage", Semiconductor Science and Technology, vol. 35, pp. 125023, oct, 2020.
, "Modeling and analysis for thermal management in gallium oxide field-effect transistors", Journal of Applied Physics, vol. 127, pp. 154502, 2020.
, "MOCVD grown epitaxial β-Ga2O3 thin film with an electron mobility of 176 cm2/V s at room temperature", APL Materials, vol. 7, pp. 022506, 2019.
, "Modeling dislocation-related leakage currents in GaN p-n diodes", Journal of Applied Physics, vol. 126, pp. 245705, 2019.
, "Molecular Beam Epitaxy: Materials and Device Applications", Wiley Series in Materials for Electronic & Optoelectronic Applications: Wiley, 2019.
, "Metal-oxide catalyzed epitaxy (MOCATAXY): the example of the O plasma-assisted molecular beam epitaxy of β-(Al x Ga 1− x ) 2 O 3 /β-Ga 2 O 3 heterostructures", Applied Physics Express, vol. 11, pp. 115503, 2018.
, "Microstructural investigation of a melt spun nickel-base superalloy with boron additions.[Ni-11% Cr-5% Al-4% Ti with B additions of 0. 06, 0. 12, and 0. 6%]", TMS (The Metallurgical Society) Paper Selection;(USA), vol. 56, no. CONF-840909–, 2018.
, "Multiple Defects Cause Degradation After High Field Stress in AlGaN/GaN HEMTs", IEEE Transactions on Device and Materials Reliability, vol. 18, pp. 364-376, Sept, 2018.
, "Many-electron effects on the dielectric function of cubic In 2 O 3: Effective electron mass, band nonparabolicity, band gap renormalization, and Burstein-Moss shift", Physical Review B, vol. 93, no. 4: APS, pp. 045203, 2016.
, "Measurement and analysis of internal loss and injection efficiency for continuous-wave blue semipolar (20 2\= 1\=) III-nitride laser diodes with chemically assisted ion beam etched facets", Applied Physics Letters, vol. 108, no. 9: AIP Publishing, pp. 091106, 2016.
, "Measurement of internal loss, injection efficiency, and gain for continuous-wave semipolar (202Ø1Ø) III-nitride laser diodes", Compound Semiconductor Week (CSW)[Includes 28th International Conference on Indium Phosphide & Related Materials (IPRM) & 43rd International Symposium on Compound Semiconductors (ISCS), 2016: IEEE, pp. 1–1, 2016.
, "Microsoft OLE DB Provider for ODBC Drivers error'80040e31'[Microsoft][SQL Server Native Client 11.0] Âðå\`\iÿ \^\iæèäàíèÿ çàïð\^\iñà èñòåêë\^\i/item. asp, line 2545", JOURNAL FUR DIE REINE UND ANGEWANDTE MATHEMATIK, vol. 2016, no. 714: Walter de Gruyter GmbH & Co. KG, pp. 151–174, 2016.
, "$ m $-Plane GaN Growth on``Double Miscut''Bulk Substrates for Blue Laser Diode Applications", Bulletin of the American Physical Society, vol. 60: APS, 2015.
, Method of controlling stress in group-III nitride films deposited on substrates, sep # " 8", 2015.
, "Molecular beam epitaxy of nitrides for advanced electronic materials", Handbook of Crystal Growth: Thin Films and Epitaxy (Second Edition), pp. 705–754, 2015.
, "Multidimensional Numerical Modeling on the Influence of Random Alloy Fluctuation in InGaN Quantum Well LED to the Transport Behavior", Applied Mathematics and Simulation for Semiconductors, Berlin, WIAS, 03/2015.
, "Metalorganic chemical vapor deposition of Al 2 O 3 using trimethylaluminum and O 2 precursors: Growth mechanism and crystallinity", Journal of Crystal Growth, vol. 408: Elsevier, pp. 78–84, 2014.

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