| Title | Metalorganic chemical vapor deposition of Al 2 O 3 using trimethylaluminum and O 2 precursors: Growth mechanism and crystallinity |
| Publication Type | Journal Article |
| Year of Publication | 2014 |
| Authors | Liu, X., SH. Chan, F. Wu, Y. Li, S. Keller, JS. Speck, and UK. Mishra |
| Journal | Journal of Crystal Growth |
| Volume | 408 |
| Pagination | 78–84 |