Publications

Found 7 results
Author Title Type [ Year(Asc)]
Filters: Author is Andrei Osinsky  [Clear All Filters]
2023
Alema, F., T. Itoh, W. Brand, A. Osinsky, and J. S. Speck, "Controllable nitrogen doping of MOCVD Ga2O3 using NH3", Applied Physics Letters, vol. 122, 2023.
Alema, F., T. Itoh, W. Brand, M. Tadjer, A. Osinsky, and J. S. Speck, "N2O grown high Al composition nitrogen doped Beta-(AlGa)2O3/Beta-Ga2O3 using MOCVD", Journal of Vacuum Science and Technology A, vol. 41, issue 4, 2023.
2022
Alema, F., T. Itoh, S. Vogt, J. S. Speck, and A. Osinsky, "Highly conductive epitaxial β-Ga2O3 and β-(AlxGa1−x)2O3 films by MOCVD", Japanese Journal of Applied Physics, vol. 61, pp. 100903, sep, 2022.
Farzana, E., F. Alema, T. Itoh, N. Hendricks, A. Mauze, A. Osinsky, and J. Speck, "β-Ga2O3 epitaxy and power devices from metal-organic chemical vapor deposition", Oxide-based Materials and Devices XIII: International Society for Optics and Photonics, 2022.
2021
Farzana, E., F. Alema, W. Ying Ho, A. Mauze, T. Itoh, A. Osinsky, and J. S. Speck, "Vertical β-Ga2O3 Schottky diodes from metal-organic chemical vapor deposition with low on-resistance and high average breakdown field", Oxide-based Materials and Devices XII: International Society for Optics and Photonics, 2021.
2020
Zhang, Y., A. Mauze, F. Alema, A. Osinsky, T. Itoh, and J. S. Speck, "β-Ga2O3 lateral transistors with high aspect ratio fin-shape channels", Japanese Journal of Applied Physics, vol. 60, pp. 014001, dec, 2020.
2019
Zhang, Y., A. Mauze, F. Alema, A. Osinsky, and J. S. Speck, "Near unity ideality factor for sidewall Schottky contacts on un-intentionally doped $\upbeta$-Ga2O3", Applied Physics Express, vol. 12, pp. 044005, mar, 2019.