Publications

Found 1602 results
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2006
Brown, J. S., P. M. Petroff, F. Wu, and J. S. Speck, "Optical properties of GaN/AlN (0001) quantum dots grown by plasma-assisted molecular beam epitaxy", Japanese journal of applied physics, vol. 45, no. 7L: IOP Publishing, pp. L669, 2006.
Paskov, PP., T. Paskova, B. Monemar, S. Figge, D. Hommel, BA. Haskell, PT. Fini, JS. Speck, and S. Nakamura, "Optical properties of nonpolar a-plane GaN layers", Superlattices and Microstructures, vol. 40, no. 4-6: Academic Press, pp. 253–261, 2006.
Koblmüller, G., CS. Gallinat, S. Bernardis, JS. Speck, GD. Chern, ED. Readinger, H. Shen, and M. Wraback, "Optimization of the surface and structural quality of N-face InN grown by molecular beam epitaxy", Applied physics letters, vol. 89, no. 7: AIP, pp. 071902, 2006.
Chichibu, S. F., A. Uedono, T. Onuma, B. A. Haskell, A. Chakraborty, T. Koyama, P. T. Fini, S. Keller, S. P. DenBaars, J. S. Speck, et al., "Origin of defect-insensitive emission probability in In-containing (Al, In, Ga) N alloy semiconductors", Nature materials, vol. 5, no. 10: Nature Publishing Group, pp. 810, 2006.
Shu, CS., A. Chini, Y. Fu, C. Poblenz, JS. Speck, and UK. Mishra, "P-gan/algan/gan enhancement-mode hemts", 64th Device Research Conference (DRC), pp. 163–164, 2006.
Hashimoto, T., K. Fujito, R. Sharma, E. R. Letts, P. T. Fini, J. S. Speck, and S. Nakamura, "Phase selection of microcrystalline GaN synthesized in supercritical ammonia", Journal of crystal growth, vol. 291, no. 1: Elsevier, pp. 100–106, 2006.
Paskov, PP., R. Schifano, T. Malinauskas, T. Paskova, JP. Bergman, B. Monemar, S. Figge, D. Hommel, BA. Haskell, PT. Fini, et al., "Photoluminescence of a-plane GaN: comparison between MOCVD and HVPE grown layers", physica status solidi (c), vol. 3, no. 6: Wiley Online Library, pp. 1499–1502, 2006.
Haskell, B. A., C. G. Van de Walle, J. S. Speck, and S. Nakamura, PI: Dr. Paul T. Fini, 2006.
Misra, P., U. Behn, O. Brandt, H. T. Grahn, B. Imer, S. Nakamura, S. P. DenBaars, and J. S. Speck, "Polarization anisotropy in GaN films for different nonpolar orientations studied by polarized photoreflectance spectroscopy", Applied physics letters, vol. 88, no. 16: AIP, pp. 161920, 2006.
Koyama, T., T. Onuma, H. Masui, A. Chakraborty, BA. Haskell, S. Keller, UK. Mishra, JS. Speck, S. Nakamura, SP. DenBaars, et al., "Prospective emission efficiency and in-plane light polarization of nonpolar m-plane In x Ga 1- x N/ Ga N blue light emitting diodes fabricated on freestanding GaN substrates", Applied physics letters, vol. 89, no. 9: AIP, pp. 091906, 2006.
Brown, J. S., G. Koblmüller, R. Averbeck, H. Riechert, and J. S. Speck, "Quadrupole mass spectrometry desorption analysis of Ga adsorbate on AlN (0001)", Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, vol. 24, no. 6: AVS, pp. 1979–1984, 2006.
Armstrong, A., A. Chakraborty, JS. Speck, SP. DenBaars, UK. Mishra, and SA. Ringel, "Quantitative observation and discrimination of AlGaN-and GaN-related deep levels in Al Ga N/ Ga N heterostructures using capacitance deep level optical spectroscopy", Applied physics letters, vol. 89, no. 26: AIP, pp. 262116, 2006.
Kaeding, JF., H. Asamizu, H. Sato, M. Iza, TE. Mates, SP. DenBaars, JS. Speck, and S. Nakamura, "Realization of high hole concentrations in Mg doped semipolar (10 1\= 1\=) GaN", Applied physics letters, vol. 89, no. 20: AIP, pp. 202104, 2006.
Onuma, T., S. Keller, SP. DenBaars, JS. Speck, S. Nakamura, UK. Mishra, T. Sota, and SF. Chichibu, "Recombination dynamics of a 268 nm emission peak in Al 0.53 In 0.11 Ga 0.36 N/ Al 0.58 In 0.02 Ga 0.40 N multiple quantum wells", Applied Physics Letters, vol. 88, no. 11: AIP, pp. 111912, 2006.
Corrion, A., C. Poblenz, P. Waltereit, T. Palacios, S. Rajan, U. K. Mishra, and J. S. Speck, "Review of recent developments in growth of AlGaN/GaN high-electron mobility transistors on 4H-SiC by plasma-assisted molecular beam epitaxy", IEICE transactions on electronics, vol. 89, no. 7: The Institute of Electronics, Information and Communication Engineers, pp. 906–912, 2006.
Corrion, A., C. Poblenz, P. Waltereit, T. Palacios, S. Rajan, U. K. Mishra, and J. S. Speck, "Special Section on Heterostructure Microelectronics with TWHM2005-GaN-Based Devices-Review of Recent Developments in Growth of AlGaN/GaN High-Electron Mobility Transistors on 4H-SiC by", IEICE Transactions on Electronics, vol. 89, no. 7: Tokyo, Japan: Institute of Electronics, Information and Communication Engineers, c1992-, pp. 906–912, 2006.
Imer, B., F. Wu, M. D. Craven, J. S. Speck, and S. P. DenBaars, "Stability of (1100) m-Plane GaN Films Grown by Metalorganic Chemical Vapor Deposition", Japanese journal of applied physics, vol. 45, no. 11R: IOP Publishing, pp. 8644, 2006.
Roder, C., S. Einfeldt, S. Figge, D. Hommel, T. Paskova, B. Monemar, BA. Haskell, PT. Fini, JS. Speck, and S. Nakamura, "Strain in a-plane GaN layers grown on r-plane sapphire substrates", physica status solidi (a), vol. 203, no. 7: Wiley Online Library, pp. 1672–1675, 2006.
Romanov, AE., TJ. Baker, S. Nakamura, JS. Speck, and ERATO/JST. U. C. S. B. Group, "Strain-induced polarization in wurtzite III-nitride semipolar layers", Journal of Applied Physics, vol. 100, no. 2: AIP, pp. 023522, 2006.
Chakraborty, A., K. Choong Kim, F. Wu, B. A. Haskell, S. Keller, J. S. Speck, S. Nakamura, S. P. DenBaars, and U. K. Mishra, "Structural and electroluminescence characteristics of nonpolar light-emitting diodes fabricated on lateral epitaxially overgrown a-Plane GaN", Japanese journal of applied physics, vol. 45, no. 11R: IOP Publishing, pp. 8659, 2006.
Shen, L., T. Palacios, C. Poblenz, A. Corrion, A. Chakraborty, N. Fichtenbaum, S. Keller, SP. DenBaars, JS. Speck, and UK. Mishra, "Unpassivated high power deeply recessed GaN HEMTs with fluorine-plasma surface treatment", IEEE Electron Device Letters, vol. 27, no. 4: IEEE, pp. 214–216, 2006.
Speck, J., T. Baker, and B. Haskell, Wafer separation technique for the fabrication of free-standing (Al, In, Ga) N wafers, 2006.
Dora, Y., S. Han, D. Klenov, P. J. Hansen, K-soo. No, U. K. Mishra, S. Stemmer, and J. S. Speck, "ZrO 2 gate dielectrics produced by ultraviolet ozone oxidation for GaN and AlGaN/ GaN transistors", Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, vol. 24, no. 2: AVS, pp. 575–581, 2006.

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