Publications

Found 83 results
Author Title Type [ Year(Asc)]
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2012
Pimputkar, S., J. S. Speck, and S. Nakamura, Group-iii nitride crystal ammonothermally grown using an initially off-oriented non-polar or semi-polar growth surface of a group-iii nitride seed crystal, 2012.
Dasgupta, S., F. Wu, J. S. Speck, U. K. Mishra, and others, "Growth and Characterization of N-Polar GaN Films on Si (111) by Plasma Assisted Molecular Beam Epitaxy", Japanese Journal of Applied Physics, vol. 51, no. 11R: IOP Publishing, pp. 115503, 2012.
Corrion, AL., F. Wu, and JS. Speck, "Growth regimes during homoepitaxial growth of GaN by ammonia molecular beam epitaxy", Journal of Applied Physics, vol. 112, no. 5: AIP, pp. 054903, 2012.
2011
Kamber, D. S., S. Pimputkar, M. Saito, S. P. DenBaars, J. S. Speck, and S. Nakamura, Group-iii nitride monocrystal with improved purity and method of producing the same, 2011.
Keller, S., Y. Dora, S. Chowdhury, F. Wu, X. Chen, S. P. DenBaars, J. S. Speck, and U. K. Mishra, "Growth and characterization of N-polar GaN and AlGaN/GaN HEMTs on (111) silicon", physica status solidi (c), vol. 8, no. 7-8: Wiley Online Library, pp. 2086–2088, 2011.
Haskell, B. A., M. B. McLaurin, S. P. DenBaars, J. Stephen Speck, and S. Nakamura, Growth of planar reduced dislocation density m-plane gallium nitride by hydride vapor phase epitaxy, 2011.
Haskell, B. A., M. B. McLaurin, S. P. DenBaars, J. Stephen Speck, and S. Nakamura, Growth of planar reduced dislocation density m-plane gallium nitride by hydride vapor phase epitaxy, jun # " 7", 2011.
Haskell, B. A., M. D. Craven, P. T. Fini, S. P. DenBaars, J. S. Speck, and S. Nakamura, Growth of reduced dislocation density non-polar gallium nitride, 2011.
Dasgupta, S., S. Choi, F. Wu, J. S. Speck, U. K. Mishra, and others, "Growth, structural, and electrical characterizations of N-polar InAlN by plasma-assisted molecular beam epitaxy", Applied physics express, vol. 4, no. 4: IOP Publishing, pp. 045502, 2011.
Chung, R. B., F. Wu, R. Shivaraman, S. Keller, S. P. DenBaars, J. S. Speck, and S. Nakamura, "Growth study and impurity characterization of AlxIn1- xN grown by metal organic chemical vapor deposition", Journal of Crystal Growth, vol. 324, no. 1: North-Holland, pp. 163–167, 2011.
2010
Pimputkar, S., D. S. Kamber, M. Saito, S. P. DenBaars, J. S. Speck, and S. Nakamura, Group-iii nitride monocrystal with improved crystal quality grown on an etched-back seed crystal and method of producing the same, 2010.
Brown, D. F., S. Keller, T. E. Mates, J. S. Speck, S. P. DenBaars, and U. K. Mishra, "Growth and characterization of In-polar and N-polar InAlN by metal organic chemical vapor deposition", Journal of Applied Physics, vol. 107, no. 3: AIP, pp. 033509, 2010.
Kamber, D. S., S. Nakamura, and J. S. Speck, Growth and manufacture of reduced dislocation density and free-standing aluminum nitride films by hydride vapor phase epitaxy, mar # " 18", 2010.
Haskell, B. A., M. D. Craven, P. T. Fini, S. P. DenBaars, J. S. Speck, and S. Nakamura, Growth of reduced dislocation density non-polar gallium nitride, 2010.
2009
Matioli, E., M. Iza, Y-S. Choi, F. Wu, S. Keller, H. Masui, E. Hu, J. Speck, and C. Weisbuch, "GaN-based embedded 2D photonic crystal LEDs: Numerical optimization and device characterization", physica status solidi (c), vol. 6, no. S2: WILEY-VCH Verlag, 2009.
Scarpulla, M. A., CS. Gallinat, S. Mack, JS. Speck, and AC. Gossard, "GdN (1 1 1) heteroepitaxy on GaN (0 0 0 1) by N2 plasma and NH3 molecular beam epitaxy", Journal of Crystal Growth, vol. 311, no. 5: North-Holland, pp. 1239–1244, 2009.
Matioli, E., S. Keller, F. Wu, Y-S. Choi, E. Hu, J. Speck, and C. Weisbuch, "Growth of embedded photonic crystals for GaN-based optoelectronic devices", Journal of Applied Physics, vol. 106, no. 2: AIP, pp. 024309, 2009.
Dasgupta, S., F. Wu, JS. Speck, and UK. Mishra, "Growth of high quality N-polar AlN (000 1) on Si (111) by plasma assisted molecular beam epitaxy", Applied Physics Letters, vol. 94, no. 15: AIP, pp. 151906, 2009.
Ben-Yaacov, T., T. Ive, C. G. Van de Walle, U. K. Mishra, J. S. Speck, and S. P. DenBaars, "Growth of In-doped ZnO films by metalorganic chemical vapor deposition on GaN (0001) templates", physica status solidi (c), vol. 6, no. 6: Wiley Online Library, pp. 1464–1467, 2009.
2008
Brown, D. F., S. Keller, F. Wu, J. S. Speck, S. P. DenBaars, and U. K. Mishra, "Growth and characterization of N-polar GaN films on SiC by metal organic chemical vapor deposition", Journal of Applied Physics, vol. 104, no. 2: AIP, pp. 024301, 2008.
Imer, B. M., J. S. Speck, S. P. DenBaars, and S. Nakamura, Growth of planar non-polar ${$1-1 0 0$}$ m-plane gallium nitride with metalorganic chemical vapor deposition (MOCVD), 2008.
2007
Hashimoto, T., F. Wu, J. S. Speck, and S. Nakamura, "A GaN bulk crystal with improved structural quality grown by the ammonothermal method", Nature materials, vol. 6, no. 8: Nature Publishing Group, pp. 568, 2007.
Keller, S., NA. Fichtenbaum, M. Furukawa, JS. Speck, SP. DenBaars, and UK. Mishra, "Growth and characterization of N-polar In Ga N/ Ga N multiquantum wells", Applied physics letters, vol. 90, no. 19: AIP, pp. 191908, 2007.
Gallinat, CS., G. Koblmüller, JS. Brown, and JS. Speck, "A growth diagram for plasma-assisted molecular beam epitaxy of In-face InN", Journal of Applied Physics, vol. 102, no. 6: AIP, pp. 064907, 2007.
Imer, B., F. Wu, J. S. Speck, and S. P. DenBaars, "Growth evolution in sidewall lateral epitaxial overgrowth (SLEO)", Journal of Crystal Growth, vol. 306, no. 2: Elsevier, pp. 330–338, 2007.

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