N-polar GaN HEMTs with fmax>300 GHz using high-aspect-ratio T-gate design

TitleN-polar GaN HEMTs with fmax>300 GHz using high-aspect-ratio T-gate design
Publication TypeConference Paper
Year of Publication2011
AuthorsDenninghoff, D. J., S. Dasgupta, D. F. Brown, S. Keller, J. Speck, and U. K. Mishra
Conference Name69th Device Research Conference
Date PublishedJune
KeywordsEpitaxial growth, gallium compounds, Gallium nitride, GaN, high electron mobility transistors, high-aspect-ratio T-gate design, III-V semiconductors, Logic gates, MOCVD, MOCVD-grown N-polar GaN HEMT, Radio frequency
DOI10.1109/DRC.2011.5994527