| Title | Atomic layer etching (ALE) of III-nitrides |
| Publication Type | Journal Article |
| Year of Publication | 2023 |
| Authors | Ho, W. Ying, Y. Chao Chow, Z. Biegler, K. Shek Qwah, T. Tak, A. Wissel-Garcia, I. Liu, F. Wu, S. Nakamura, and J. S. Speck |
| Journal | Applied Physics Letters |
| Volume | 123 |
| Issue | 6 |