New fabrication method of InGaN laser diode by epitaxial lateral overgrowth and cleavable technique from free-standing non- and semi-polar GaN substrate

TitleNew fabrication method of InGaN laser diode by epitaxial lateral overgrowth and cleavable technique from free-standing non- and semi-polar GaN substrate
Publication TypeConference Paper
Year of Publication2021
AuthorsKamikawa, T., S. Gandrothula, H. Li, B. V. Olivia, F. Wu, D. Cohen, J. S. Speck, S. P. DenBaars, and S. Nakamura
EditorFujioka, H., H. Morkoç, and U. T. Schwarz
Conference NameGallium Nitride Materials and Devices XVI
PublisherInternational Society for Optics and Photonics
Keywordscleave, epitaxial lateral overgrowth, GaN, laser, non-polar, removal, semi-polar, substrate recycling
URLhttps://doi.org/10.1117/12.2584814
DOI10.1117/12.2584814