| Title | Impact of $$\backslash$hbox ${$CF$}$ _ ${$4$}$ $ Plasma Treatment on GaN |
| Publication Type | Journal Article |
| Year of Publication | 2007 |
| Authors | Chu, R., C. Soo Suh, M. Hoi Wong, N. Fichtenbaum, D. Brown, L. McCarthy, S. Keller, F. Wu, J. S. Speck, and U. K. Mishra |
| Journal | IEEE Electron Device Letters |
| Volume | 28 |
| Pagination | 781–783 |