Metalorganic chemical vapor deposition conditions for efficient silicon doping in high Al-composition AlGaN films

TitleMetalorganic chemical vapor deposition conditions for efficient silicon doping in high Al-composition AlGaN films
Publication TypeJournal Article
Year of Publication2005
AuthorsKeller, S., P. Cantu, C. Moe, Y. Wu, S. Keller, U. K. Mishra, J. S. Speck, and S. P. DenBaars
JournalJapanese journal of applied physics
Volume44
Pagination7227