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2018

Dolinski, Neil D., Zachariah A. Page, Benjamin E. Callaway, Fabian Eisenreich, , Roberto Chavez, David P. Bothman, Stefan Hecht, Frank W. Zok, and Craig J. Hawker. "Solution Mask Liquid Lithography (SMaLL) for One-Step, Multimaterial 3D Printing." ADVANCED MATERIALS 30 (2018): 1800364.