Publications

Author Title Type [ Year(Asc)]
Filters: Author is Bothman, David P. and First Letter Of Title is S  [Clear All Filters]
2018
Dolinski, Neil D., Zachariah A. Page, Benjamin E. Callaway, Fabian Eisenreich, , Roberto Chavez, David P. Bothman, Stefan Hecht, Frank W. Zok, and Craig J. Hawker. "Solution Mask Liquid Lithography (SMaLL) for One-Step, Multimaterial 3D Printing." ADVANCED MATERIALS 30 (2018): 1800364.