Digital lithographic processing for large-area electronics

TitleDigital lithographic processing for large-area electronics
Publication TypeJournal Article
Year of Publication2007
AuthorsW.S. Wong, M.L. Chabinyc, Scott Limb, S.E. Ready, R.A. Lujan, Jurgen Daniel, and R.A. Street
JournalJOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY
Volume15
Pagination463-470
ISSN1071-0922
Keywordsamorphous silicon, color filters, flexible electronics, image sensor arrays, jet printing, thin-film transistor
AbstractA non-contact jet-printed mask-patterning process is described. By combining digital imaging with jet printing, digital lithography was used to pattern a-Si:H-based electronics on glass and plastic substrates in place of conventional photolithography. This digital lithographic process is capable of layer-to-layer registration of +/- 5 mu m using electronic mask files that are directly jet printed onto a surface. A minimum feature size of 50 mu m was used to create 180 x 180 element backplanes having 75-dpi resolution for display and image-sensor applications. By using a secondary mask process, the minimum feature size can be reduced down to similar to 15 mu m for fabrication of short-channel thin-film transistors. The same process was also used to pattern black-matrix wells in fabricating color-filter top plates in LCD panels.
DOI10.1889/1.2759551