|Digital lithographic processing for large-area electronics
|Year of Publication
|W.S. Wong, M.L. Chabinyc, Scott Limb, S.E. Ready, R.A. Lujan, Jurgen Daniel, and R.A. Street
|JOURNAL OF THE SOCIETY FOR INFORMATION DISPLAY
|amorphous silicon, color filters, flexible electronics, image sensor arrays, jet printing, thin-film transistor
|A non-contact jet-printed mask-patterning process is described. By combining digital imaging with jet printing, digital lithography was used to pattern a-Si:H-based electronics on glass and plastic substrates in place of conventional photolithography. This digital lithographic process is capable of layer-to-layer registration of +/- 5 mu m using electronic mask files that are directly jet printed onto a surface. A minimum feature size of 50 mu m was used to create 180 x 180 element backplanes having 75-dpi resolution for display and image-sensor applications. By using a secondary mask process, the minimum feature size can be reduced down to similar to 15 mu m for fabrication of short-channel thin-film transistors. The same process was also used to pattern black-matrix wells in fabricating color-filter top plates in LCD panels.