@article {1686,
	title = {Electron backscattered diffraction using a new monolithic direct detector: High resolution and fast acquisition},
	journal = {Ultramicroscopy},
	volume = {220},
	year = {2021},
	pages = {113160},
	abstract = {<p>
	A monolithic active pixel sensor based direct detector that is optimized for the primary beam energies in scanning electron microscopes is implemented for electron back-scattered diffraction (EBSD) applications. The high detection efficiency of the detector and its large array of pixels allow sensitive and accurate detection of Kikuchi bands arising from primary electron beam excitation energies of 4 keV to 28 keV, with the optimal contrast occurring in the range of 8\&ndash;16 keV. The diffraction pattern acquisition speed is substantially improved via a sparse sampling mode, resulting from the acquisition of a reduced number of pixels on the detector. Standard inpainting algorithms are implemented to effectively estimate the information in the skipped regions in the acquired diffraction pattern. For EBSD mapping, an acquisition speed as high as 5988 scan points per second is demonstrated, with a tolerable fraction of indexed points and accuracy. The collective capabilities spanning from high angular resolution EBSD patterns to high speed pattern acquisition are achieved on the same detector, facilitating simultaneous detection modalities that enable a multitude of advanced EBSD applications, including lattice strain mapping, structural refinement, low-dose characterization, 3D-EBSD and dynamic in situ EBSD.
</p>
},
	keywords = {Direct detection, EBSD, Indexing, Inpainting, SEM, Sparse sampling},
	issn = {18792723},
	doi = {10.1016/j.ultramic.2020.113160},
	url = {https://doi.org/10.1016/j.ultramic.2020.113160},
	author = {Wang, Fulin and Echlin, Mclean P. and Taylor, Aidan A. and Shin, Jungho and Bammes, Benjamin and Levin, Barnaby D.A. and De Graef, Marc and Pollock, Tresa M. and Gianola, Daniel S.}
}
@article {1431,
	title = {Advanced detector signal acquisition and electron beam scanning for high resolution SEM imaging},
	journal = {Ultramicroscopy},
	volume = {195},
	year = {2018},
	pages = {93{\textendash}100},
	abstract = {<p>
	The advancement of materials science at the mesoscale requires improvements in both sampling volumes/areas and spatial resolution in order to make statistically significant measurements of microstructures that influence higher-order material properties, such as fatigue and fracture. Therefore, SEM-based techniques have become desirable due to improvements in imaging resolution, large sample handling capability, and flexibility for in-situ instrumentation. By using fast sampling of SEM electron detector signals, intrinsic beam scanning defects have been identified that are related to the response time of the SEM electron beam deflectors and electron detectors. Mitigation of these beam scanning defects using detector sampling approaches and an adaptive model for settling time is shown to produce higher resolution SEM images, at faster image acquisition times, with a means to quantify the different response functions for various beam deflectors and detectors including those for electrons and ions.
</p>
},
	keywords = {High resolution digital image correlation, Image processing, Imaging defects, Scan generator, Scanning electron microscopy, SEM},
	issn = {18792723},
	doi = {10.1016/j.ultramic.2018.08.025},
	url = {https://doi.org/10.1016/j.ultramic.2018.08.025},
	author = {Lenthe, William C. and Stinville, Jean Charles and Echlin, Mclean P. and Chen, Zhe and Daly, Samantha and Pollock, Tresa M.}
}
